Nano-imprint lithography (NIL) creates nanoscale surface structures at a fraction of photolithography cost. Sub-100nm pattern transfer using precision-engineered molds and servo-controlled uniform pressure. Both UV-cure and thermal imprinting modes supported.
Feature sizes below 100nm — enabling nano-LED pitch control, anti-reflection structures, diffractive optics, and semiconductor device features at far lower cost than EUV.
UV-cure: room temperature, fast cycle. Thermal: up to 200°C, broader substrate compatibility. Process mode is recipe-selectable.
Active uniform force across entire substrate area — critical for defect-free pattern transfer, especially near mold edges.
Standard specifications. Custom design and manufacturing available per customer requirements.
| Resolution | Sub-100nm |
|---|---|
| Process Modes | UV (room temp), Thermal (up to 200°C) |
| Pressure | Servo-controlled uniform force |
| Applications | Nano-LED, micro-LED, anti-reflection, diffractive optics |
| Custom Molds | Available on request |
Contact us for technical specifications, machining test requests, or a custom quote.
Our engineering team will respond directly.