Nano-imprint lithography (NIL) creates nanoscale surface structures at a fraction of photolithography cost. Sub-100nm pattern transfer using precision-engineered molds and servo-controlled uniform pressure. Both UV-cure and thermal imprinting modes supported.
Feature sizes below 100nm — enabling nano-LED pitch control, anti-reflection structures, diffractive optics, and semiconductor device features at far lower cost than EUV.
UV-cure: room temperature, fast cycle. Thermal: up to 200°C, broader substrate compatibility. Process mode is recipe-selectable.
Active uniform force across entire substrate area — critical for defect-free pattern transfer, especially near mold edges.
Two model variants: ANT-4 (UV photo-curing) and ANT-6H (UV + Thermal hybrid). Custom design and manufacturing available.
PATENTS
Imprint roller auto-leveling system (KR 10-2015-0072634) · Imprint device (KR 10-1408741) · KR 0522040 / US 7,140,866 B2 · KR 0585951 / US 7,202,935 B2 · PCT/KR2006/002230
| ANT-4 — UV Photo-Curing Nano Imprinting | |
| Curing Type | UV (Ultra-Violet) |
|---|---|
| Stamp | Quartz · Si · PFPE · PDMS · PC |
| Wafer Size | 1 ~ 4 inch |
| Imprinting Pressure | ≤ 2 bar · Room Temperature |
| Imprinting Mode | Single Layer / Single Step |
| Imprinting Head | Chip-size Multi-Head · Multiple Fixturing / Air Chucking |
| XYZ Stage | Stroke 250 × 120 × 25 mm · Z Sliding Unit |
| UV System | 40 mW/cm² (2 kW) |
| Anti-Vibration | Cut-off 1 ~ 1.5 Hz |
| Controller | UMAC-2 |
| ANT-6H — Thermal & UV Hybrid Nano Imprinting | |
| Curing Type | UV · Thermal · UV+Thermal hybrid |
| Stamp | Quartz · Si · Ni |
| Wafer Size | 1 ~ 6 inch |
| Imprinting Mode | Multi-Layer / Multi-Step |
| Patent | KR 0585951 · US 7,202,935 B2 · PCT/KR2006/002230 (Patent pending: 0043670) |
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